Surface Techniques
The Physics of Surface Science
We designed AUSSL to have several standard and specialty techniques that address a wide variety of surface, interface, and thin film phenomena. Three Kratos XSAM 800 surface analytical systems with Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS) and ion scattering (ISS) enable study of the chemical composition and bonding characteristics of surfaces with sub-monolayer sensitivity.
The dynamics of surface reactions and surface chemical bonding is probed by scanning kinetic spectroscopy (SKS), thermal desorption techniques (TPD), and electron-stimulated desorption (ESD). Rutherford backscattering spectroscopy (RBS) and light ion channeling enable non-destructive and quantitative materials analysis of layered thin film materials.
Our First Major Instrument
A Kratos XSAM800 multi-technique surface analysis system, still yielding great data.
Characterization of film microstructure is carried out by digital optical (polarizing and stereo) microscopy, scanning electron microscopy (SEM), transmission electron microscopy (STEM), and atomic force microscopy (AFM). Energy dispersive X-ray spectroscopy (EDS) allows for analysis of surface microstructural phases, elemental mapping, and line scans over interfaces.
Hall effect equipment, current-voltage (I-V), and capacitance-voltage (CV) measurements enable study of electronic transport properties. Photolithography and thin film deposition equipment enable the manufacture of circuit test structures, ohmic, and Schottky barrier contacts.
A brief description of our major techniques ...
